Design simulations of a horizontally deflecting high-heat-load monochromator

The performance of a liquid-nitrogen-cooled high-heat-load monochromator with horizontal scattering plane has been analysed, aiming to preserve the high quality X-ray beam in vertical for downstream optics. Using finite-element analysis, height profiles crystal surface various heat loads and corresponding slope errors meridional sagittal planes were calculated. Then angular distortions reflected both calculated analytically also modelled by ray tracing, revealing good agreement two approaches. results show that increasing load reach their smallest values first then plane. For considered case interest at photon energy 14.412 keV Si(111) reflection Bragg angle 7.88°, are an order magnitude smaller than one. Furthermore, they typical size source position. operating plane, appear Thus, such instrument perfectly preserves Compared scattering, throughput monochromatic is reduced only 3.3% new EBS source, instead 34.3% old ESRF-1 machine. This identifies horizontal-scattering as device essentially free heat-load effects without significant loss terms throughput.